Program – Invited Speakers

Invited Speakers

Tutorial

  • Tsuyoshi Moriya (Tokyo Electron)
    “Innovation of Semiconductor Manufacturing Equipment by Intelligent control”

Plenary Talks

  • Daiju Nakano (IBM Research – Tokyo)
    “The First Quantum Computer Installed in Japan”
  • Shinichi Takagi (Univ. of Tokyo)
    “Channel Material and Device Technology for Advanced Logic CMOS”
  • Takashi Yunogami (Fine Processing Institute)
    “Semiconductors Indispensable for Human Civilization -2050 Global Semiconductor Market Forecast-“

Invited Talks

  • Hirokazu Fukidome (Tohoku Univ.)
    “Development and Exploring Physics of Low Environmental Load Beyond 5G Devices Using SiC as a Platform”
  • Masaya Kawano (Univ. of Tokyo)
    “Advanced 3D Stacking Technology for High Density Heterogeneous Integration”
  • Koji Kita (Univ. of Tokyo)
    “Material Sciences in SiC MOS Interface Formation through Surface Oxidation and Surface Nitridation Reactions”
  • Masaharu Kobayashi (Univ. of Tokyo)
    “3D Integrated Memory Devices Enabled by Oxide Semiconductor”
  • Kosuke Nagashio (Univ. of Tokyo)
    ” Toward Novel Functional Devices Based on 2D Layered Materials”
  • Takashi Nakayama (Chiba Univ.)
    “Stabilization of Ferroelectric Orthorhombic HfO2: First-Principles Calculation View”
  • Tetsuo Narita (Toyota Central R&D Labs.)
    “Progress on and Challenges of GaN Power MOSFETs using AlSiO gate oxides”

Special Invited Talk

  • Roger Loo (imec)
    “Epitaxial Ge Virtual Substrates and Ge-on-Nothing on Si: Comparison of Material Properties”

Rump Session

“Present and Future Prospects of Semiconductor Electronics Industry and Engineering”

Panelist:

  • Manabu Tsujimura (EBARA)
  • Kenji Tateiwa (Tower Partners Semiconductor)
  • Nahomi Aoto (Micron Memory Japan, K.K.)
  • Hiroomi Eguchi (MIRISE Technologies)